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Effect of the SiCl(4) Flow Rate on SiBN Deposition Kinetics in SiCl(4)-BCl(3)-NH(3)-H(2)-Ar Environment

To improve the thermal and mechanical stability of SiC(f)/SiC or C/SiC composites with SiBN interphase, SiBN coating was deposited by low pressure chemical vapor deposition (LPCVD) using SiCl(4)-BCl(3)-NH(3)-H(2)-Ar gas system. The effect of the SiCl(4) flow rate on deposition kinetics was investiga...

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Dades bibliogràfiques
Publicat a:Materials (Basel)
Autors principals: Li, Jianping, Qin, Hailong, Liu, Yongsheng, Ye, Fang, Li, Zan, Cheng, Laifei, Zhang, Litong
Format: Artigo
Idioma:Inglês
Publicat: MDPI 2017
Matèries:
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC5553535/
https://ncbi.nlm.nih.gov/pubmed/28772986
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma10060627
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