Cita APA

Li, J., Qin, H., Liu, Y., Ye, F., Li, Z., Cheng, L., & Zhang, L. (2017). Effect of the SiCl(4) Flow Rate on SiBN Deposition Kinetics in SiCl(4)-BCl(3)-NH(3)-H(2)-Ar Environment. Materials (Basel).

Chicago Style Citation

Li, Jianping, Hailong Qin, Yongsheng Liu, Fang Ye, Zan Li, Laifei Cheng, i Litong Zhang. "Effect of the SiCl(4) Flow Rate On SiBN Deposition Kinetics in SiCl(4)-BCl(3)-NH(3)-H(2)-Ar Environment." Materials (Basel) 2017.

Cita MLA

Li, Jianping, et al. "Effect of the SiCl(4) Flow Rate On SiBN Deposition Kinetics in SiCl(4)-BCl(3)-NH(3)-H(2)-Ar Environment." Materials (Basel) 2017.

Atenció: Aquestes cites poden no estar 100% correctes.