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Plasma Enhanced Complete Oxidation of Ultrathin Epitaxial Praseodymia Films on Si(111)
Praseodymia films have been exposed to oxygen plasma at room temperature after deposition on Si(111) via molecular beam epitaxy. Different parameters as film thickness, exposure time and flux during plasma treatment have been varied to study their influence on the oxygen plasma oxidation process. Th...
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| Publicado no: | Materials (Basel) |
|---|---|
| Main Authors: | , , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5512919/ https://ncbi.nlm.nih.gov/pubmed/28793569 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma8095312 |
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