載入...
Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates
Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 μm/h on silicon, and 4 μm/h on Ti–6Al–4V were achieved. In a chemistry of H(2)/CH(4)/N(2), varying ratios of CH(4)/H(2) and N(2)/CH(4)...
Na minha lista:
| 發表在: | Materials (Basel) |
|---|---|
| Main Authors: | , , , |
| 格式: | Artigo |
| 語言: | Inglês |
| 出版: |
MDPI
2014
|
| 主題: | |
| 在線閱讀: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5453140/ https://ncbi.nlm.nih.gov/pubmed/28788461 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma7010365 |
| 標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|