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Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates
Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 μm/h on silicon, and 4 μm/h on Ti–6Al–4V were achieved. In a chemistry of H(2)/CH(4)/N(2), varying ratios of CH(4)/H(2) and N(2)/CH(4)...
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| Publicado no: | Materials (Basel) |
|---|---|
| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2014
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5453140/ https://ncbi.nlm.nih.gov/pubmed/28788461 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma7010365 |
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