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Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates

Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 μm/h on silicon, and 4 μm/h on Ti–6Al–4V were achieved. In a chemistry of H(2)/CH(4)/N(2), varying ratios of CH(4)/H(2) and N(2)/CH(4)...

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Detalhes bibliográficos
Publicado no:Materials (Basel)
Main Authors: Samudrala, Gopi K., Vohra, Yogesh K., Walock, Michael J., Miles, Robin
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2014
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5453140/
https://ncbi.nlm.nih.gov/pubmed/28788461
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma7010365
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