Structural Properties Characterized by the Film Thickness and Annealing Temperature for La(2)O(3) Films Grown by Atomic Layer Deposition

La(2)O(3) films were grown on Si substrates by atomic layer deposition technique with different thickness. Crystallization characteristics of the La(2)O(3) films were analyzed by grazing incidence X-ray diffraction after post-deposition rapid thermal annealing treatments at several annealing tempera...

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Udgivet i:Nanoscale Res Lett
Main Authors: Wang, Xing, Liu, Hongxia, Zhao, Lu, Fei, Chenxi, Feng, Xingyao, Chen, Shupeng, Wang, Yongte
Format: Artigo
Sprog:Inglês
Udgivet: Springer US 2017
Fag:
Nano Express
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC5371540/
https://ncbi.nlm.nih.gov/pubmed/28359142
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2018-8
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