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Absorption Amelioration of Amorphous Si Film by Introducing Metal Silicide Nanoparticles
Amorphous Si (a-Si) films with metal silicide are expected to enhance the absorption ability of pure a-Si films. In this present study, NiSi (20 nm)/Si (40 nm) and AlSi (20 nm)/Si (40 nm) bilayer thin films are deposited through radio frequency (RF) sputtering at room temperature. The influence of t...
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| Pubblicato in: | Nanoscale Res Lett |
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| Autori principali: | , , , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Springer US
2017
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5368101/ https://ncbi.nlm.nih.gov/pubmed/28351127 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-2003-2 |
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