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Absorption Amelioration of Amorphous Si Film by Introducing Metal Silicide Nanoparticles
Abstract Amorphous Si (a-Si) films with metal silicide are expected to enhance the absorption ability of pure a-Si films. In this present study, NiSi (20 nm)/Si (40 nm) and AlSi (20 nm)/Si (40 nm) bilayer thin films are deposited through radio frequency (RF) sputtering at room temperature. The influ...
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| Main Authors: | , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
SpringerOpen
2017-03-01
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| Colecção: | Nanoscale Research Letters |
| Assuntos: | |
| Acesso em linha: | http://link.springer.com/article/10.1186/s11671-017-2003-2 |
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