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Investigation of switching mechanism in HfO(x)-ReRAM under low power and conventional operation modes

Low-power resistive random access memory (LP-ReRAM) devices have attracted increasing attention owing to their advantages of low operation power. In this study, a vertical-type LP-ReRAM consisting of TiN/Ti/HfO(2)/TiN structure was fabricated. The switching mechanism for LP-ReRAM was elucidated as t...

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Publicat a:Sci Rep
Autors principals: Feng, Wei, Shima, Hisashi, Ohmori, Kenji, Akinaga, Hiroyuki
Format: Artigo
Idioma:Inglês
Publicat: Nature Publishing Group 2016
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC5175169/
https://ncbi.nlm.nih.gov/pubmed/28000741
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep39510
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