טוען...
Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO(2)(Ti)/SiO(2)/Si stacks
We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO(2)/SiO(2)/Si and Ti/SiO(2)/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity...
שמור ב:
| הוצא לאור ב: | Sci Technol Adv Mater |
|---|---|
| Main Authors: | , , , , , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
Taylor & Francis
2012
|
| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5090293/ https://ncbi.nlm.nih.gov/pubmed/27877468 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/1468-6996/13/1/015001 |
| תגים: |
הוספת תג
אין תגיות, היה/י הראשונ/ה לתייג את הרשומה!
|