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Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO(2)(Ti)/SiO(2)/Si stacks
We developed a mathematical analysis method of reflectometry data and used it to characterize the internal structure of TiO(2)/SiO(2)/Si and Ti/SiO(2)/Si stacks. Atomic concentration profiles of all the chemical elements composing the samples were reconstructed from the analysis of the reflectivity...
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| Publicado no: | Sci Technol Adv Mater |
|---|---|
| Main Authors: | , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Taylor & Francis
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5090293/ https://ncbi.nlm.nih.gov/pubmed/27877468 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/1468-6996/13/1/015001 |
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