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Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface

[Image: see text] Surface-limited deposition reactions leading to the formation of copper nanoparticles on H-terminated Si(111) surface can serve as a model for understanding the role of structure of the deposition precursor molecules in determining the oxidation state of the metal deposited. This s...

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Bibliografische gegevens
Gepubliceerd in:J Phys Chem C Nanomater Interfaces
Hoofdauteurs: Duan, Yichen, Gao, Fei, Teplyakov, Andrew V.
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: 2015
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Online toegang:https://ncbi.nlm.nih.gov/pmc/articles/PMC4959445/
https://ncbi.nlm.nih.gov/pubmed/27482303
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.jpcc.5b08287
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