Wird geladen...

Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface

[Image: see text] Surface-limited deposition reactions leading to the formation of copper nanoparticles on H-terminated Si(111) surface can serve as a model for understanding the role of structure of the deposition precursor molecules in determining the oxidation state of the metal deposited. This s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:J Phys Chem C Nanomater Interfaces
Hauptverfasser: Duan, Yichen, Gao, Fei, Teplyakov, Andrew V.
Format: Artigo
Sprache:Inglês
Veröffentlicht: 2015
Schlagworte:
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC4959445/
https://ncbi.nlm.nih.gov/pubmed/27482303
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.jpcc.5b08287
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!