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Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface
[Image: see text] Surface-limited deposition reactions leading to the formation of copper nanoparticles on H-terminated Si(111) surface can serve as a model for understanding the role of structure of the deposition precursor molecules in determining the oxidation state of the metal deposited. This s...
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| Pubblicato in: | J Phys Chem C Nanomater Interfaces |
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| Autori principali: | , , |
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
2015
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4959445/ https://ncbi.nlm.nih.gov/pubmed/27482303 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.jpcc.5b08287 |
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