Duan, Y., Gao, F., & Teplyakov, A. V. (2015). Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions on H-Terminated Si(111) Surface. J Phys Chem C Nanomater Interfaces.
Chicago Style CitationDuan, Yichen, Fei Gao, and Andrew V. Teplyakov. "Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions On H-Terminated Si(111) Surface." J Phys Chem C Nanomater Interfaces 2015.
MLA CitationDuan, Yichen, Fei Gao, and Andrew V. Teplyakov. "Role of the Deposition Precursor Molecules in Defining Oxidation State of Deposited Copper in Surface Reduction Reactions On H-Terminated Si(111) Surface." J Phys Chem C Nanomater Interfaces 2015.