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Integration scheme of nanoscale resistive switching memory using bottom-up processes at room temperature for high-density memory applications

A facile and versatile scheme is demonstrated to fabricate nanoscale resistive switching memory devices that exhibit reliable bipolar switching behavior. A solution process is used to synthesize the copper oxide layer into 250-nm via-holes that had been patterned in Si wafers. Direct bottom-up filli...

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Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Han, Un-Bin, Lee, Jang-Sik
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2016
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4929478/
https://ncbi.nlm.nih.gov/pubmed/27364856
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep28966
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