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Dusty Plasma Studies in the Gaseous Electronics Conference Reference Cell
Particle “dust” in processing plasmas is of critical concern to the semiconductor industry because of the threat particles pose to device yield. A number of important investigations into the formation, growth, charging, transport and consequences of particulate dust in plasmas have been made using t...
Enregistré dans:
| Publié dans: | J Res Natl Inst Stand Technol |
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| Auteurs principaux: | , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1995
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| Sujets: | |
| Accès en ligne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4887230/ https://ncbi.nlm.nih.gov/pubmed/29151754 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.100.034 |
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