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The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II
A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY...
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| Publicado no: | J Synchrotron Radiat |
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| Main Authors: | , , , , , , , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
International Union of Crystallography
2016
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4733934/ https://ncbi.nlm.nih.gov/pubmed/26698047 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S1600577515020615 |
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