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Dynamics of mass transport during nanohole drilling by local droplet etching

Local droplet etching (LDE) utilizes metal droplets during molecular beam epitaxy for the self-assembled drilling of nanoholes into III/V semiconductor surfaces. An essential process during LDE is the removal of the deposited droplet material from its initial position during post-growth annealing. T...

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Podrobná bibliografie
Vydáno v:Nanoscale Res Lett
Hlavní autoři: Heyn, Christian, Bartsch, Thorben, Sanguinetti, Stefano, Jesson, David, Hansen, Wolfgang
Médium: Artigo
Jazyk:Inglês
Vydáno: Springer US 2015
Témata:
On-line přístup:https://ncbi.nlm.nih.gov/pmc/articles/PMC4385027/
https://ncbi.nlm.nih.gov/pubmed/25852364
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0779-5
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