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Dynamics of mass transport during nanohole drilling by local droplet etching
Local droplet etching (LDE) utilizes metal droplets during molecular beam epitaxy for the self-assembled drilling of nanoholes into III/V semiconductor surfaces. An essential process during LDE is the removal of the deposited droplet material from its initial position during post-growth annealing. T...
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| 出版年: | Nanoscale Res Lett |
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| 主要な著者: | , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer US
2015
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4385027/ https://ncbi.nlm.nih.gov/pubmed/25852364 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0779-5 |
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