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Si/Ge intermixing during Ge Stranski–Krastanov growth
The Stranski–Krastanov growth of Ge islands on Si(001) has been widely studied. The morphology changes of Ge islands during growth, from nucleation to hut/island formation and growth, followed by hut-to-dome island transformation and dislocation nucleation of domes, have been well described, even at...
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| Vydáno v: | Beilstein J Nanotechnol |
|---|---|
| Hlavní autoři: | , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Beilstein-Institut
2014
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4273217/ https://ncbi.nlm.nih.gov/pubmed/25551065 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.5.246 |
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