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Formation of nanostructured silicon surfaces by stain etching

In this work, we report the fabrication of ordered silicon structures by chemical etching of silicon in vanadium oxide (V(2)O(5))/hydrofluoric acid (HF) solution. The effects of the different etching parameters including the solution concentration, temperature, and the presence of metal catalyst fil...

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Detalhes bibliográficos
Publicado no:Nanoscale Res Lett
Main Authors: Ayat, Maha, Belhousse, Samia, Boarino, Luca, Gabouze, Noureddine, Boukherroub, Rabah, Kechouane, Mohamed
Formato: Artigo
Idioma:Inglês
Publicado em: Springer 2014
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4242786/
https://ncbi.nlm.nih.gov/pubmed/25435830
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-482
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