Cargando...
Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si Surface
This work pertains to the method for modification of silicon (Si) wafer morphology by metal-assisted chemical etching (MacEtch) technique suitable for fabrication of antireflective Si surfaces. For this purpose, we made different Au catalyst patterns on the surface of Si substrate. This modification...
Gardado en:
| Publicado en: | Nanoscale Res Lett |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Springer US
2017
|
| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5307424/ https://ncbi.nlm.nih.gov/pubmed/28209027 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-1886-2 |
| Tags: |
Engadir etiqueta
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!
|