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Silicon Nanostructures Produced by Modified MacEtch Method for Antireflective Si Surface
This work pertains to the method for modification of silicon (Si) wafer morphology by metal-assisted chemical etching (MacEtch) technique suitable for fabrication of antireflective Si surfaces. For this purpose, we made different Au catalyst patterns on the surface of Si substrate. This modification...
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| Foilsithe in: | Nanoscale Res Lett |
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| Main Authors: | , , , , |
| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe: |
Springer US
2017
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| Ábhair: | |
| Rochtain Ar Líne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5307424/ https://ncbi.nlm.nih.gov/pubmed/28209027 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-017-1886-2 |
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