Á lódáil...
Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si(3)N(4) mask
A new fabrication method is proposed to produce nanostructures on monocrystalline silicon based on the friction-induced selective etching of its Si(3)N(4) mask. With low-pressure chemical vapor deposition (LPCVD) Si(3)N(4) film as etching mask on Si(100) surface, the fabrication can be realized by n...
Na minha lista:
| Main Authors: | , , , |
|---|---|
| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe: |
Springer
2014
|
| Ábhair: | |
| Rochtain Ar Líne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4036082/ https://ncbi.nlm.nih.gov/pubmed/24940174 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-241 |
| Clibeanna: |
Cuir Clib Leis
Gan Chlibeanna, Bí ar an gcéad duine leis an taifead seo a chlibeáil!
|