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Maskless micro/nanofabrication on GaAs surface by friction-induced selective etching
In the present study, a friction-induced selective etching method was developed to produce nanostructures on GaAs surface. Without any resist mask, the nanofabrication can be achieved by scratching and post-etching in sulfuric acid solution. The effects of the applied normal load and etching period...
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| Autores principales: | , , , , |
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| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3925353/ https://ncbi.nlm.nih.gov/pubmed/24495647 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-59 |
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