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Fabrication mechanism of friction-induced selective etching on Si(100) surface
As a maskless nanofabrication technique, friction-induced selective etching can easily produce nanopatterns on a Si(100) surface. Experimental results indicated that the height of the nanopatterns increased with the KOH etching time, while their width increased with the scratching load. It has also...
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| Main Authors: | , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3311066/ https://ncbi.nlm.nih.gov/pubmed/22356699 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-152 |
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