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Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si(3)N(4) mask
A new fabrication method is proposed to produce nanostructures on monocrystalline silicon based on the friction-induced selective etching of its Si(3)N(4) mask. With low-pressure chemical vapor deposition (LPCVD) Si(3)N(4) film as etching mask on Si(100) surface, the fabrication can be realized by n...
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| Autores principales: | , , , |
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| Formato: | Artigo |
| Lenguaje: | Inglês |
| Publicado: |
Springer
2014
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| Materias: | |
| Acceso en línea: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4036082/ https://ncbi.nlm.nih.gov/pubmed/24940174 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-241 |
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