Cryogenic Etching of Silicon: An Alternative Method For Fabrication of Vertical Microcantilever Master Molds

This paper examines the use of deep reactive ion etching (DRIE) of silicon with fluorine high-density plasmas at cryogenic temperatures to produce silicon master molds for vertical microcantilever arrays used for controlling substrate stiffness for culturing living cells. The resultant profiles achi...

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Hauptverfasser: Addae-Mensah, Kweku A., Retterer, Scott, Opalenik, Susan R., Thomas, Darrell, Lavrik, Nickolay V., Wikswo, John P.
Format: Artigo
Sprache:Inglês
Veröffentlicht: 2009
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Article
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC3818692/
https://ncbi.nlm.nih.gov/pubmed/24223478
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/JMEMS.2009.2037440
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