Cryogenic Etching of Silicon: An Alternative Method For Fabrication of Vertical Microcantilever Master Molds

This paper examines the use of deep reactive ion etching (DRIE) of silicon with fluorine high-density plasmas at cryogenic temperatures to produce silicon master molds for vertical microcantilever arrays used for controlling substrate stiffness for culturing living cells. The resultant profiles achi...

Deskribapen osoa

Gorde:
Xehetasun bibliografikoak
Egile Nagusiak: Addae-Mensah, Kweku A., Retterer, Scott, Opalenik, Susan R., Thomas, Darrell, Lavrik, Nickolay V., Wikswo, John P.
Formatua: Artigo
Hizkuntza:Inglês
Argitaratua: 2009
Gaiak:
Article
Sarrera elektronikoa:https://ncbi.nlm.nih.gov/pmc/articles/PMC3818692/
https://ncbi.nlm.nih.gov/pubmed/24223478
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/JMEMS.2009.2037440
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