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Cryogenic Etching of Silicon: An Alternative Method For Fabrication of Vertical Microcantilever Master Molds
This paper examines the use of deep reactive ion etching (DRIE) of silicon with fluorine high-density plasmas at cryogenic temperatures to produce silicon master molds for vertical microcantilever arrays used for controlling substrate stiffness for culturing living cells. The resultant profiles achi...
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| Glavni autori: | , , , , , |
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| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
2009
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| Teme: | |
| Online pristup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3818692/ https://ncbi.nlm.nih.gov/pubmed/24223478 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/JMEMS.2009.2037440 |
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