Cryogenic Etching of Silicon: An Alternative Method For Fabrication of Vertical Microcantilever Master Molds

This paper examines the use of deep reactive ion etching (DRIE) of silicon with fluorine high-density plasmas at cryogenic temperatures to produce silicon master molds for vertical microcantilever arrays used for controlling substrate stiffness for culturing living cells. The resultant profiles achi...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Prif Awduron: Addae-Mensah, Kweku A., Retterer, Scott, Opalenik, Susan R., Thomas, Darrell, Lavrik, Nickolay V., Wikswo, John P.
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: 2009
Pynciau:
Article
Mynediad Ar-lein:https://ncbi.nlm.nih.gov/pmc/articles/PMC3818692/
https://ncbi.nlm.nih.gov/pubmed/24223478
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/JMEMS.2009.2037440
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