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Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices
Patterning of materials at sub-10 nm dimensions is at the forefront of nanotechnology and employs techniques of various complexity, efficiency, areal scale, and cost. Colloid-based patterning is known to be capable of producing individual sub-10 nm objects. However, ordered, large-area nano-arrays,...
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| Autors principals: | , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Beilstein-Institut
2012
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3554416/ https://ncbi.nlm.nih.gov/pubmed/23365801 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.3.98 |
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