Cita APA

Iovan, A., Fischer, M., Lo Conte, R., & Korenivski, V. (2012). Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices. Beilstein-Institut.

Chicago Style Citation

Iovan, Adrian, Marco Fischer, Roberto Lo Conte, i Vladislav Korenivski. Sub-10 Nm Colloidal Lithography for Circuit-integrated Spin-photo-electronic Devices. Beilstein-Institut, 2012.

Cita MLA

Iovan, Adrian, Marco Fischer, Roberto Lo Conte, i Vladislav Korenivski. Sub-10 Nm Colloidal Lithography for Circuit-integrated Spin-photo-electronic Devices. Beilstein-Institut, 2012.