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Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers
A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible po...
Bewaard in:
| Hoofdauteurs: | , , , , , |
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| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
Beilstein-Institut
2012
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| Onderwerpen: | |
| Online toegang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3458608/ https://ncbi.nlm.nih.gov/pubmed/23019558 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.3.71 |
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