Huang, C., Moosmann, M., Jin, J., Heiler, T., Walheim, S., & Schimmel, T. (2012). Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers. Beilstein-Institut.
Citação norma ChicagoHuang, Cheng, Markus Moosmann, Jiehong Jin, Tobias Heiler, Stefan Walheim, and Thomas Schimmel. Polymer Blend Lithography: A Versatile Method to Fabricate Nanopatterned Self-assembled Monolayers. Beilstein-Institut, 2012.
Citação norma MLAHuang, Cheng, et al. Polymer Blend Lithography: A Versatile Method to Fabricate Nanopatterned Self-assembled Monolayers. Beilstein-Institut, 2012.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.