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Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch(2)
Polymer blend lithography (PBL) is a spin-coating-based technique that makes use of the purely lateral phase separation between two immiscible polymers to fabricate large area nanoscale patterns. In our earlier work (Huang et al. 2012), PBL was demonstrated for the fabrication of patterned self-asse...
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| Publicado no: | Beilstein J Nanotechnol |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Beilstein-Institut
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4464460/ https://ncbi.nlm.nih.gov/pubmed/26171297 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.6.123 |
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