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Polymer blend lithography for metal films: large-area patterning with over 1 billion holes/inch(2)
Polymer blend lithography (PBL) is a spin-coating-based technique that makes use of the purely lateral phase separation between two immiscible polymers to fabricate large area nanoscale patterns. In our earlier work (Huang et al. 2012), PBL was demonstrated for the fabrication of patterned self-asse...
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| Vydáno v: | Beilstein J Nanotechnol |
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| Hlavní autoři: | , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Beilstein-Institut
2015
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4464460/ https://ncbi.nlm.nih.gov/pubmed/26171297 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.6.123 |
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