Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by phot...

Disgrifiad llawn

Wedi'i Gadw mewn:
Manylion Llyfryddiaeth
Prif Awduron: Fischer, Ulrich Christian, Hentschel, Carsten, Fontein, Florian, Stegemann, Linda, Hoeppener, Christiane, Fuchs, Harald, Hoeppener, Stefanie
Fformat: Artigo
Iaith:Inglês
Cyhoeddwyd: Beilstein-Institut 2014
Pynciau:
Full Research Paper
Mynediad Ar-lein:https://ncbi.nlm.nih.gov/pmc/articles/PMC4168865/
https://ncbi.nlm.nih.gov/pubmed/25247126
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.5.156
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