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Ordered GeSi nanorings grown on patterned Si (001) substrates
An easy approach to fabricate ordered pattern using nanosphere lithography and reactive iron etching technology was demonstrated. Long-range ordered GeSi nanorings with 430 nm period were grown on patterned Si (001) substrates by molecular beam epitaxy. The size and shape of rings were closely assoc...
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| Hauptverfasser: | , , , , |
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer
2011
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3211261/ https://ncbi.nlm.nih.gov/pubmed/21711732 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-6-205 |
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