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Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe Islands

A lithography-free method for fabricating the nanogrids and quasi-beehive nanostructures on Si substrates is developed. It combines sequential treatments of thermal annealing with reactive ion etching (RIE) on SiGe thin films grown on (100)-Si substrates. The SiGe thin films deposited by ultrahigh v...

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Detalhes bibliográficos
Main Authors: Chang, Yuan-Ming, Jian, Sheng-Rui, Juang, Jenh-Yih
Formato: Artigo
Idioma:Inglês
Publicado em: Springer 2010
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC2920400/
https://ncbi.nlm.nih.gov/pubmed/20730116
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s11671-010-9661-7
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