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ToF-SIMS Depth Profiling of Organic Films: A Comparison between Single Beam and Dual-beam Analysis

In dual-beam depth profiling, a high energy analysis beam and a lower energy etching beam are operated in series. Although the fluence of the analysis beam is usually kept well below the static SIMS limit, complete removal of the damage induced by the high energy analysis beam while maintaining a go...

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Detalhes bibliográficos
Main Authors: Brison, J., Muramoto, S., Castner, David G.
Formato: Artigo
Idioma:Inglês
Publicado em: 2010
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC2850126/
https://ncbi.nlm.nih.gov/pubmed/20383274
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/jp9066179
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