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Interface characterization of metal-HfO2-InAs gate stacks using hard x-ray photoemission spectroscopy
MOS devices based on III-V semiconductors and thin high-k dielectric layers offer possibilities for improved transport properties. Here, we have studied the interface structure and chemical composition of realistic MOS gate stacks, consisting of a W or Pd metal film and a 6- or 12-nm-thick HfO2 laye...
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| 主要な著者: | , , , , , , , |
|---|---|
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
AIP Publishing LLC
2013-07-01
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| シリーズ: | AIP Advances |
| オンライン･アクセス: | http://link.aip.org/link/doi/10.1063/1.4817575 |
| タグ: |
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