Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were...

Celý popis

Uloženo v:
Podrobná bibliografie
Hlavní autoři: Tetsuma Marumo, Shin Hiwasa, Jun Taniguchi
Médium: Artigo
Jazyk:Inglês
Vydáno: MDPI AG 2020-10-01
Edice:Nanomaterials
Témata:
ultraviolet nanoimprint lithography
durability
anisotropy
contact angle
line and space
On-line přístup:https://www.mdpi.com/2079-4991/10/10/1956
Tagy: Přidat tag
Žádné tagy, Buďte první, kdo otaguje tento záznam!

Podobné jednotky