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Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin
Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were...
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| Publié dans: | Nanomaterials (Basel) |
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| Auteurs principaux: | , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
MDPI
2020
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| Sujets: | |
| Accès en ligne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC7601754/ https://ncbi.nlm.nih.gov/pubmed/33019541 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10101956 |
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