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Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were...

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Detalhes bibliográficos
Publicado no:Nanomaterials (Basel)
Main Authors: Marumo, Tetsuma, Hiwasa, Shin, Taniguchi, Jun
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2020
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC7601754/
https://ncbi.nlm.nih.gov/pubmed/33019541
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano10101956
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