Transfer Durability of Line-Patterned Replica Mold Made of High-Hardness UV-Curable Resin

Ultraviolet nanoimprint lithography (UV-NIL) requires high durability of the mold for the mass production of nanostructures. To evaluate the durability of a line-patterned replica mold made of high-hardness UV curable resin, repetitive transfer and contact angle measurements of the replica mold were...

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Main Authors: Tetsuma Marumo, Shin Hiwasa, Jun Taniguchi
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2020-10-01
Colecção:Nanomaterials
Assuntos:
ultraviolet nanoimprint lithography
durability
anisotropy
contact angle
line and space
Acesso em linha:https://www.mdpi.com/2079-4991/10/10/1956
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