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TECHNOLOGICAL ASPECTS REGARDING THE USE OF PHOTOLITOGRAPHY IN OBTAINING MICRO-ELECTRO-MECHANICAL SYSTEMS (MEMS)

Micro-electro-mechanical systems (MEMS) include a vast area corresponding to the technological development in the last decades. MEMS are included in a multitude of areas, almost in everything that surrounds us. This aids of small dimensions and high tech are increasingly present in our daily life....

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Main Authors: Roxana Marinescu, Daniel Liviu Ghiculescu
Format: Artigo
Language:Inglês
Published: Editura Politehnica, Timisoara 2017-03-01
Series:Nonconventional Technologies Review
Subjects:
lithography
photolithography
mask
wafer
deposit
exposure
Online Access:http://www.revtn.ro/index.php/revtn/article/view/166
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