Ferroelectric Behavior of Micro‐ to Submicron‐Scale HZO Capacitors: Impact of the Perimeter‐to‐Area Ratio
ABSTRACT The aggressive scaling of electronic devices has brought ferroelectric materials to the forefront of nanoscale research, where lateral dimensions strongly influence switching dynamics and device performance. In this context, W/ Hf0.5Zr0.5O2/ p‐Ge capacitors with top electrode sizes ranging...
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| Główni autorzy: | , , , , , , , , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
Wiley-VCH
2026-07-01
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| Seria: | Advanced Electronic Materials |
| Hasła przedmiotowe: | |
| Dostęp online: | https://doi.org/10.1002/aelm.202500879 |
| Etykiety: |
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