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High Conversion-Gain Pinned-Photodiode Pump-Gate Pixels in 180-nm CMOS Process

This paper presents the design and characterization of high conversion-gain pixels in a 180-nm CMOS image sensor process. By reducing overlapping capacitance between a floating diffusion and transfer gate, output-referred pixel conversion gain as high as 118uV/eand read noise as low as 1.8erms are e...

Ausführliche Beschreibung

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Bibliografische Detailangaben
Hauptverfasser: Song Chen, Jiaju Ma, Donald B. Hondongwa, Eric R. Fossum
Format: Artigo
Sprache:Inglês
Veröffentlicht: IEEE 2017-01-01
Schriftenreihe:IEEE Journal of the Electron Devices Society
Schlagworte:
Online-Zugang:https://ieeexplore.ieee.org/document/8047441/
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