Lithography Alignment Techniques Based on Moiré Fringe
In Moiré fringe lithography alignment technology, alignment is realized by monitoring the grating interference fringe image in real-time. The technique exhibits excellent sensitivity to displacement changes and is not easily affected by the gap changes between the mask and silicon wafer. Therefore,...
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| Autori principali: | , , , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
MDPI AG
2023-03-01
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| Serie: | Photonics |
| Soggetti: | |
| Accesso online: | https://www.mdpi.com/2304-6732/10/4/351 |
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