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CNTFET-based SRAM cell design using INDEP technique

As the size of the transistor decreases in the nanoscale regime, certain parameters, such as, cell stability, power dissipation, and delay, have changed. This poses a significant challenge when attempting to scale down metal oxide semiconductor field effect transistor (MOSFET). The carbon nanotube f...

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書誌詳細
主要な著者: Mehwish Maqbool, Vijay Kumar Sharma, Neeraj Kaushik
フォーマット: Artigo
言語:Inglês
出版事項: Elsevier 2024-03-01
シリーズ:e-Prime: Advances in Electrical Engineering, Electronics and Energy
主題:
オンライン・アクセス:http://www.sciencedirect.com/science/article/pii/S2772671124000597
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