Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO<sub>2</sub> Deposited by RF Plasma Sputter
In this study, the effect of annealing and substrate conditions on the ferroelectricity of undoped hafnium oxide (HfO<sub>2</sub>) was analyzed. Hafnium oxide was deposited on various substrates such as platinum, titanium nitride, and silicon (Pt, TiN, Si) through RF magnetron sputtering. Annealing...
Sábháilte in:
| Príomhchruthaitheoirí: | , , , , , , |
|---|---|
| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe / Cruthaithe: |
MDPI AG
2024-08-01
|
| Sraith: | Nanomaterials |
| Ábhair: | |
| Rochtain ar líne: | https://www.mdpi.com/2079-4991/14/17/1386 |
| Clibeanna: |
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
|