Sputtering of silicon nanopowders by an argon cluster ion beam
In this work an Ar+ cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 1014–2.3 × 1016 cluster/cm2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters...
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| 主要な著者: | , , , , , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Beilstein-Institut
2019-01-01
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| シリーズ: | Beilstein Journal of Nanotechnology |
| 主題: | |
| オンライン･アクセス: | https://doi.org/10.3762/bjnano.10.13 |
| タグ: |
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