Sputtering of silicon nanopowders by an argon cluster ion beam

In this work an Ar+ cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 1014–2.3 × 1016 cluster/cm2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters...

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Bibliografiske detaljer

Principais autores:	Xiaomei Zeng, Vasiliy Pelenovich, Zhenguo Wang, Wenbin Zuo, Sergey Belykh, Alexander Tolstogouzov, Dejun Fu, Xiangheng Xiao
Format:	Artigo
Sprog:	Inglês
Udgivet:	Beilstein-Institut 2019-01-01
Serier:	Beilstein Journal of Nanotechnology
Fag:	finite size effect gas cluster ion beam silicon nanoparticles smoothing effect sputtering
Online adgang:	https://doi.org/10.3762/bjnano.10.13
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