Sputtering of silicon nanopowders by an argon cluster ion beam
In this work an Ar+ cluster ion beam with energy in the range of 10–70 keV and dose of 7.2 × 1014–2.3 × 1016 cluster/cm2 was used to irradiate pressed Si nanopowder targets consisting of particles with a mean diameter of 60 nm. The influence of the target density and the cluster ion beam parameters...
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| Hauptverfasser: | , , , , , , , |
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Beilstein-Institut
2019-01-01
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| Schriftenreihe: | Beilstein Journal of Nanotechnology |
| Schlagworte: | |
| Online-Zugang: | https://doi.org/10.3762/bjnano.10.13 |
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